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EUV Illumination
Hyperion has recently been involved with an EUV illuminator design for a
revolutionary microdischarge plasma light source technology from
Starfire Industries. This arrayed source has potential to
dramatically improve the optical efficiency of future EUV illuminators.
The source and the optical design concepts have been well received by
the semiconductor industry.
The optical design challenge is to multiplex the sources to form uniform
reticle illumination while preserving the pupil mapping from illuminator
to projection lens. By reducing the mirror count found in many
contemporary EUV illuminators, the efficiency of the EUV optics can be
greatly improved.
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EUV Illumination design for custom EUV optics |
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Illumination analysis and array source models |
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Reflective homogenizer optics |
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